Reactive Ion Etching (Rie) System Plasmapro 80 Rie
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Product Overview
Key Features
The PlasmaPro 80 reactive ion etch (RIE) is a compact, small footprint system offering versatile etch and deposition solutions with convenient open loading. It is easy to site and easy to use, with no compromise on process quality. The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high performance processes using optimised electrode cooling and excellent substrate temperature control.
Open load design allows fast wafer loading and unloading
Excellent etch control and rate determination
Excellent wafer temperature uniformity
Up to 200mm wafers
Low cost of ownership
Built to Semi S2/S8 standards
Company Details
Business Type
Manufacturer, Service Provider, Distributor, Supplier
Employee Count
11
Establishment
2012
Working Days
Monday To Sunday
GST NO
27AABCO6283B1ZK
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Seller Details
GST - 27AABCO6283B1ZK
Mumbai, Maharashtra
Accepts only Domestic inquiries
Marketing Manager
Mr Abhijat Saklani
Address
Unit No - 11, Marwah's Complex, Krishnalal Marwah Marg, Mumbai, Maharashtra, 400072, India
etching machine in Mumbai
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