Reactive Ion Etching (Rie) System Plasmapro 80 Rie

As a renowned company, we are engaged in manufacturing and supplying a wide range of Reactive Ion Etching (RIE) System PlasmaPro 80 RIE in Mumbai, Maharashtra, India.

The PlasmaPro 80 reactive ion etch (RIE) is a compact, small footprint system offering versatile etch and deposition solutions with convenient open loading. It is easy to site and easy to use, with no compromise on process quality. The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high performance processes using optimised electrode cooling and excellent substrate temperature control.
Open load design allows fast wafer loading and unloading
Excellent etch control and rate determination
Excellent wafer temperature uniformity
Up to 200mm wafers
Low cost of ownership
Built to Semi S2/S8 standards