Plasmapro 80 Icp

Our company is considered as a leading company that manufacture and supply a large range of PlasmaPro 80 ICP in Mumbai, Maharashtra, India.

The PlasmaPro 80 ICP is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise on process quality. The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high performance processes using optimised electrode cooling and excellent substrate temperature control.

Open load design allows fast wafer loading and unloading
Excellent etch control and rate determination
Excellent wafer temperature uniformity
Up to 200mm wafers
Low cost of ownership
Built to Semi S2/S8 standards