Icp Etch System Plasmapro 100 Cobra

We are considered as a reputed firm, we are engaged in manufacturing and supplying a wide range of ICP Etch System PlasmaPro 100 Cobra in Mumbai, Maharashtra, India.

The PlasmaPro 100 range of etch and deposition tools can be fitted with a variety of substrate electrodes, enabling processes over a wide temperature range. They offer a 200mm platform with single wafer and multi-wafer batch capability. The process modules offer excellent uniformity, high throughput and high precision processes.

Wide temperature range electrode, -150A C to 400A C
Compatible with all wafer sizes up to 200mm
Rapid change between wafer sizes
Low cost of ownership and ease of serviceability
Compact footprint, flexible layout
In-situ chamber cleaning and end-pointing