Plasmapro 100 Icpcvd
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Product Specifications
| Cleaning | In-situ |
| Dominant Color | Gray |
| Electrodes | Resistive heated |
| Features | High quality films, Wide temperature range, High throughput, Compact footprint, Low cost, Ease of use |
| Pressure | Low |
| Product Type | CVD System |
| Temperature Range | Room temp - 400 C |
| Usage | Thin film deposition for semiconductor manufacturing. |
| Wafer Size | Up to 200mm |
Product Overview
Key Features
The ICP CVD process module is designed to produce high quality films from room temperature to 400A C with high density plasmas at low deposition pressures and temperatures.
Excellent uniformity, high throughput and high precision processes
High quality films
Wide temperature range electrode
Compatible with all wafer sizes up to 200mm
Rapid change between wafer sizes
Low cost of ownership and ease of serviceability
Compact footprint, flexible layout
Resistive heated electrodes with capability up to 400A C or 1200A C
In-situ chamber cleaning and end-pointing
Company Details
Business Type
Manufacturer, Service Provider, Distributor, Supplier
Employee Count
11
Establishment
2012
Working Days
To
GST NO
27AABCO6283B1ZK
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Seller Details
GST - 27AABCO6283B1ZK
Mumbai, Maharashtra
Accepts only Domestic inquiries
Marketing Manager
Mr Abhijat Saklani
Address
Unit No - 11, Marwah's Complex, Krishnalal Marwah Marg, Mumbai, Maharashtra, 400072, India
Scientific Instruments in Mumbai
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