Pecvd System For Oled Barrier Layers (El-pecvd Lab-100)
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Product Specifications
| Product Type | Pecvd System |
| Substrate Size | 100X100Mm2 |
| Throughput | 5,000/Year |
| Dimension | 1,400L |
| Tcp Power | Ac 3Kw |
| Bias Power | Ac 600W |
| Heater | Silicon Carbide |
| Pump | Dry & Turbo |
| Features | Oled Barrier, High Density, Pc Controlled |
Product Overview
Key Features
SiOx and SiNx rf-PECVD system for R&D and small scale production.
Designed to be compatible with OLED cluster system.
Transformer-coupled high density plasma source.
System and process controlled automatically by PC.
Specifications
Substrate : 100x100mm2, 150x150mm2 glass
Average throughput : Up to 5,000 substrates per year
Dimension : 1,400L A 1,900H A 2,000W (mm3)
Power : AC 3kW for TCP source(13.56MHz)
AC 600W for bias(13.56MHz)
Deposition gas : SiH4/NH3/N2/N2O/O2/He/H2
Chamber cleaning gas : NF3/N2O/O2
Heater : silicon carbide(heating rate: 40A C/min, max. temp.: 800A C, temp. deviation : negligible)
Pump : Dry(2,000 l/min) & Turbo(1,200 l/s)
Company Details
Focusing on a customer-centric approach, A-Tech System has a pan-India presence and caters to a huge consumer base throughout the country. Buy Industrial Automation in bulk from A-Tech System at Trade India quality-assured products.
Business Type
Manufacturer, Supplier
Establishment
1995
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Seller Details
Incheon, Incheon
Mr. Yoon Choi
Address
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South
Industrial Automation in Incheon
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