High Density Plasma Etching System For Waveguides (Cluster Etch-300)
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Product Specifications
| Wafer Capacity | 1 6" |
| Dimension | 1,810L |
| Power | AC 3kW |
| Gas | CF4/O2 |
| Substrate | Si/SiO2 |
| Pump | Rotary/Turbo |
| Application | Metal/Silica |
| Features | High Throughput, Automated System, Versatile Etching, Precise Control, R&D Production |
Product Overview
Key Features
Wafer capacity : 1 A 6"
Dimension : 1,810L A 1,800H A 1,222W (mm3)
Power : AC 3kW for TCP source(13.56MHz)
AC 600W for bias voltage(13.56MHz)
Gas : CF4 / O2 / He / SF6
Substrate material : Si/SiO2
Pump : Rotary(600 l/min, 900 l/min) & Turbo(500 l/s, 1000 l/s)
Applications :
Metal etching, Silica etching, Polymer etching
Special Features :
TCP etching system with 3 chambers for R&D and small scale production.
Automatic robot transporting system.
ESC (Electro Static Chuck) and He cooling system for silica etching.
Average throughput Up to 250,000 wafers per year.
Company Details
Focusing on a customer-centric approach, A-Tech System has a pan-India presence and caters to a huge consumer base throughout the country. Buy Industrial Automation in bulk from A-Tech System at Trade India quality-assured products.
Business Type
Manufacturer, Supplier
Establishment
1995
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Seller Details
Incheon, Incheon
Mr. Yoon Choi
Address
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South
Industrial Automation in Incheon
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