High Density Plasma Etching System For Waveguides (Cluster Etch-300)
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Product Specifications
| Application | Metal/Silica |
| Dimension | 1,810L |
| Features | High Throughput, Automated System, Versatile Etching, Precise Control, R&D Production |
| Gas | CF4/O2 |
| Power | AC 3kW |
| Pump | Rotary/Turbo |
| Substrate | Si/SiO2 |
| Wafer Capacity | 1 6" |
Product Overview
Key Features
Wafer capacity : 1 A 6"
Dimension : 1,810L A 1,800H A 1,222W (mm3)
Power : AC 3kW for TCP source(13.56MHz)
AC 600W for bias voltage(13.56MHz)
Gas : CF4 / O2 / He / SF6
Substrate material : Si/SiO2
Pump : Rotary(600 l/min, 900 l/min) & Turbo(500 l/s, 1000 l/s)
Applications :
Metal etching, Silica etching, Polymer etching
Special Features :
TCP etching system with 3 chambers for R&D and small scale production.
Automatic robot transporting system.
ESC (Electro Static Chuck) and He cooling system for silica etching.
Average throughput Up to 250,000 wafers per year.
Company Details
A-Tech System is listed in Trade India's list of verified sellers offering supreme quality of Arc Discharge System For Transparent Electrode (Arclab-200), Arc Discharge System for SWCNTs Production (ArcPilot-200), Evaporation System for Continuous Al Deposition (Roll Evaporator-1000), etc. Buy Industrial Automation in bulk from us for the best quality products and service.
Business Type
Manufacturer, Supplier
Establishment
1995
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Seller Details
Incheon, Incheon
Name
Mr. Yoon Choi
Address
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South
Industrial Automation in Incheon
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