
Thermal Cvd System For Nanowire Synthesis (Pecvd Nano Lab-100)
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Product Overview
Key Features
Multi-functional thermal CVD system for nanowire synthesis.
Combined with plasma treatment and probe station.
Maximum substrate temperature : 900A C.
Growth direction controllable
Automatic loading available during subsceptor heating.
High density plasma source for chamber cleaning.
PC-based control system.
Specifications
Average throughput 4,800 wafer / year
Wafer capacity : 6" wafer A 1
Dimension : 1,175L A 1,551H A 870W (mm3)
Power : TCP power supply RF 1kW
Bias power supply RF 300W
Gas : GeH4, SiH4, H2, B2H6, PH3, N2, NH3
Heater : Heating element - graphite
max. temp. :1,200A C,
Pump : Dry pump (1,400 l/s)
Company Details
Focusing on a customer-centric approach, A-Tech System has a pan-India presence and caters to a huge consumer base throughout the country. Buy Industrial Supplies-General in bulk from A-Tech System at Trade India quality-assured products.
Business Type
Manufacturer, Supplier
Establishment
1995
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Seller Details
Incheon, Incheon
Mr. Yoon Choi
Address
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South
Industrial Supplies-General in Incheon
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