Pecvd System With High Density Plasma (Pecvd Lab-1000)
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Product Specifications
| Features | Sio2 Pecvd, High Density, Smooth Surface, High Throughput, Excellent Uniformity |
Product Overview
Key Features
SiO2 PECVD system for R&D and small scale production.
Excellent thickness and reflective index uniformity in deposited layer (avg. 7Aum).
Highly smooth surface(RMS roughness of deposited layer : 30.6A ).
Transformer coupled high density plasma.
Specifications
Wafer capacity : 1 A 4"
Average throughput : Up to 5,000 wafers per year
Dimension : 1,730L A 1,277H A 725W (mm3)
Power : AC 1.2kW for TCP source(13.56MHz)
AC 600W for bias voltage(13.56MHz)
Gas : SiH4 / O2
Susceptor material : graphite
Heater : silicon carbide(heating rate: 40A C/min, max. temp.: 800A C, temp. deviation : negligible)
Pump : rotary(600 l/min) & turbo( 500 l/s)
Company Details
Focusing on a customer-centric approach, A-Tech System has a pan-India presence and caters to a huge consumer base throughout the country. Buy Industrial Automation in bulk from A-Tech System at Trade India quality-assured products.
Business Type
Manufacturer, Supplier
Establishment
1995
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Seller Details
Incheon, Incheon
Mr. Yoon Choi
Address
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South
Industrial Automation in Incheon
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