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Pecvd System For Solar Cell Ar Coatings (Pecvd Lab-300)
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Pecvd System For Solar Cell Ar Coatings (Pecvd Lab-300)

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Product Specifications

Dimensions1730x1027x1832 mm
Power2kW AC
Temperature uniformity2°C
Thickness uniformity<2%
Cycle time<15 min
Throughput21600 wafers/year
Pump typeDry & Turbo
FeaturesHigh throughput, Uniform coating, Fast cycle time, Automated system, Precise control, Small footprint, Easy operation, Reliable process

Product Overview

Key Features

Our range of PECVD System for Solar Cell AR Coatings (PECVD Lab-300) are available at following Features :-
Capacitively-Coupled PECVD system with loadlock chamber for R&D and small scale production.
Automatic loadlock system with cassette.
Uniform gas distribution through shower head.

Specifications
Substrate temperature uniformity : a A 2A C @400A C within 6"
Thickness uniformity of deposited layers : Cycle time : <15mins
Average throughput : Up to 21,600 wafers per year
Dimension : 1,730L A 1,027H A 1,832W (mm3)
Power : AC 2kW (13.56MHz) VHF & MF Power compatible
Gas : NF3/O2/H2/SiH4/N2/NH3/N2O/Ar
Substrate material : Si wafer
Pump : Dry(1,200l/min & 200l/min) & turbo(600l/s)

Company Details

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Seller Details

Incheon, Incheon

Mr. Yoon Choi

Address

175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South

Industrial Automation in Incheon

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