Magnetron Sputtering Target
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Product Specifications
| Density | >95% |
| Diameter | Variable |
| Features | High Purity, Uniformity, Long Lifespan, High Density, Customizable, Excellent Performance, Precise dimensions |
| Material | Copper |
| Mounting Holes | Multiple |
| Purity | 99.99% |
| Surface Finish | Polished |
| Thickness | Variable |
Product Overview
Key Features
High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
These Magnetron Sputtering Target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
Company Details
China New Metal Materials Technology Co.,Ltd is listed in Trade India's list of verified sellers offering supreme quality of Magnetron Sputtering Target, etc. Buy Magnets & Magnetic Devices in bulk from us for the best quality products and service.
Business Type
Exporter, Supplier
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Seller Details
Beijing, Beijing
Name
Wendy Wen
Address
Room A-320, Zhongguancun Science and Technology park, Yongtai middle street 25, Haidian District, Beijing, China. Beijing, Beijing, 100192, China
sputtering target in Beijing
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