Product TypeSputtering Target
MaterialRotary Niv
Size3874Mm
Id125Mm
Od158Mm
Purity99%
MaterialCopper
DiameterVariable
ThicknessVariable
Purity99.99%
Density>95%
Surface FinishPolished
MaterialVarious
PurityHigh
ShapeRectangular
SizeCustom
BondingAvailable
RoughnessSmooth
Price: 50 USD ($)/Piece
MOQ1 Piece/Pieces
Chemical Compositioncopper 99.999
Product Typeas request
MaterialOther
ShapeOther
Purity99.999%
ApplicationThin Film Coating
MaterialITO
CompositionIn2O3:SnO2=90:10wt%
Purity99.99%
ShapeSquare/Round
Size25-300mm
Thickness3-10mm
MaterialVarious Metals
DiameterVaried
LengthCustomized
Purity99%+
Surface FinishSmooth
ToleranceTight
MaterialTantalum
Purity99.95%
Diameter50mm
Thickness5mm
ShapeRectangular
Surface FinishPolished
Product TypeMetal
MaterialTungsten
ShapeRod Bar Sheet Roll
ApplicationConstruction
ColorGrey
HardnessSolid
Product TypeMetal
MaterialSilver
AlloyYes
ApplicationConstruction
ColorSilver
AppearanceSilver
Purity99.95%min
Density10.2g/cm3min
ProcessingSurface polishing CNC
StandardGB/T 3876-2007
ShapeCircular disc
Price: 30 USD ($)/Kilograms
MOQ1 Kilograms/Kilograms
Purity99.95%
Product TypeMetal
Materialmolybdenum
ShapeOther
Chemical CompositionM
Application1 Suitable for producing ion implantation parts. 2 For producing electric light source partscomponentsof electric vacuum and electric power semiconductor. 3 For producing Mo-boatsheat shield and heat bodies in high temperature furnace.
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| Company Name | Currency | Product Name | Price |
|---|---|---|---|
| - | - | Coating Material Cu Sputtering Copper Target | 50 USD ($) (Approx.) |
| - | - | Pure Molybdenum Sputtering Targets | 30 USD ($) (Approx.) |
| - | - | Sputtering Target | 1 USD ($) (Approx.) |
| - | - | gr1 titanium sputtering target | 13.0 USD ($) (Approx.) |
| - | - | 99.95% Pure Molybdenum round sputtering target for PVD | 30 USD ($) (Approx.) |
| - | - | titanium tube target for sputtering use | nan USD ($) (Approx.) |
| - | - | High Purity 99.95% Tantalum Sputtering Target | 600 USD ($) (Approx.) |
| - | - | Cr Target | 5 USD ($) (Approx.) |
What is the delivery time for sputtering target in Beijing?
MaterialTitanium
Diameter50-200mm
Thickness5-50mm
Purity99.95%
Tolerance+/-0.1mm
Surface finishRa<0.4μm
MaterialCr Cu W Mo...
ShapeVarious
SizeCustomizable
Purity99.99%
DensityVariable
UsageMagnetron sputtering coating applications
Price Trend: 100.00 - 300.00 USD ($)/Piece
MOQ1 Piece/Pieces
Product Typeceramic target
Physical FormOthe
Shapeother
Purity99.5%99.95%
Price: 13.0 USD ($)/Piece
MOQ1 Piece/Pieces
Product Typedisc
Types of AlloyTitanium Alloys
MaterialTitanium
TypeSeamless
ShapeSquare
Strength458
Price: 30 USD ($)/Set
MOQ1 Set/Sets
FeatureHigh purity and high compactness. High quality for PVD industry.
Product TypeNon-ferrous Metal
Materialmolybdenum
ShapeLump
Chemical Composition99.95 purity molybdenum
Purity99.95
MaterialNiobium
Purity>=99.95%
SizeCustomizable
ShapeCircular/Rectangular
Thickness1mm-28mm
Diameter25mm-400mm
Price Trend: 24.00 - 63.00 USD ($)/Kilograms
MOQ1 Kilograms/Kilograms
Product TypePlate
MaterialTitanium
ConnectionWelding
ShapeRectangular
StandardASME ASTM ASTM A53-2007
Surface TreatmentGalvanized
Price: nan USD ($)/Piece
MOQ50 Piece/Pieces
Product TypeMachine Parts
TechnologyCNC
Surface TreatmentOther
Colorsilver
Price: 600 USD ($)/Kilograms
MOQ1 Kilograms/Kilograms
Purity99.95% Pure Tantalum
Product TypeMetal
MaterialTantalum
Moisture0%
Chemical CompositionPure Ta
ApplicationOther
MaterialTantalum
Purity99.95%
Thickness0.5-10mm
Width50-800mm
Length50-2000mm
StandardsGB/T ASTM
MOQ1 Ton/Tons
PurityHigh
Product TypeMetal
MaterialTitanium Titanium Alloy Nickel Tantalum Niobium Zirconium
ShapeOther
ColorGray
MaterialTitanium GR1
GradeGR1
StandardASTM B265
SizeCustomizable
Purity99.9%
PackagingWooden case
Price: 5 USD ($)/Piece
MOQ5 Piece/Pieces
HardnessHigh
StrengthDurable
Product TypeOther Metal Target
MaterialChromium Metal
AlloyCr Target
ShapeOther Disc
MaterialTitanium Alloys
ShapesCylindrical Plate Tube
StandardsASTM B348/381
PurityHigh
SurfaceCustomizable
DimensionsVariable
MaterialSiO2
Diameter Range10-50 mm
Thickness Range2-10 mm
Surface FinishFused
Purity99.99%
UsageSputtering target for thin film deposition
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