Magnetron Sputtering Target
Product Overview
Key Features
CNM could provide high quality Magnetron Sputtering Target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.
High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
These Magnetron Sputtering Target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
These Magnetron Sputtering Target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
Company Details
China New Metal Materials Technology Co.,Ltd, Registered in 2011 at Beijing in Beijing, is a leading Exporter,Supplier of Magnets & Magnetic Devices in China. China New Metal Materials Technology Co.,Ltd is one of Trade India's verified and trusted sellers of listed products. With extensive experience in supplying and trading Magnetron Sputtering Target, China New Metal Materials Technology Co.,Ltd has made a reputed name for itself in the market with high-quality Magnetron Sputtering Target, etc.
Focusing on a customer-centric approach, China New Metal Materials Technology Co.,Ltd has a pan-India presence and caters to a huge consumer base throughout the country. Buy Magnets & Magnetic Devices in bulk from China New Metal Materials Technology Co.,Ltd at Trade India quality-assured products.
Focusing on a customer-centric approach, China New Metal Materials Technology Co.,Ltd has a pan-India presence and caters to a huge consumer base throughout the country. Buy Magnets & Magnetic Devices in bulk from China New Metal Materials Technology Co.,Ltd at Trade India quality-assured products.
Business Type
Exporter, Supplier
Seller Details
C
China New Metal Materials Technology Co.,Ltd
Name
Wendy Wen
AddressView on Map
Room A-320, Zhongguancun Science and Technology park, Yongtai middle street 25, Haidian District, Beijing, China. Beijing, Beijing, 100192, China
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