Sputtering Target

MOQ2KGS Kilograms/Kilograms

Product NameSiO2 granule

Product Typematerial

MaterialSiO2

Colorwhite

Applicationevaporation coating

Shapegranule

MOQ50 Piece/Pieces

ShapeSheet, Rod

Purity99.99% min

MaterialTi Cr Zr Al Ni Nb Ta Mo.etc

Dimension(L*W*H)dia.35mm/38mm/45mm or as your need Perch

ApplicationOther

Product TypeMetal

Purity99.99

Product TypeMetal Alloy

Materialcustomized

Alloycustomized

Chemical Compositioncustomized

ApplicationMetal Component

HardnessSolid

Product TypeMetal

MaterialSilver

AlloyYes

ApplicationConstruction

ColorSilver

MOQ1 Kilograms/Kilograms

Purity99.95% Pure Tantalum

Product TypeMetal

MaterialTantalum

Moisture0%

Chemical CompositionPure Ta

ApplicationOther

Product DescriptionAvail from us high quality sputtering targets such as:\015\012 * Metal sputtering targets\015\012 * Alloy sputtering targets\015\012 * Ceramic & crystal sputtering targets\015\012 * Rare earth metal sputtering targets

Product DescriptionWe are manufacturing, exporting and supplying our customers a wide range of Tungsten Sputtering Target in Luoyang, Henan, China. These are available following Specifications :- Grade: W1 Purity :> =99.95% Melting Point: 3410C Boiling Point:5927C Density: 19.2g/cm3 High quality, workability Product F

Product DescriptionWe are a reputed name in this industry as a Manufacturer and Exporter of Rare Earth Metals Sputtering Target in Huizhou, Guangdong, China. Our company can produce all kinds of single-Rare Earth metals,alloys and nearly 60 types metal target materials,alloy target materials,all kinds of magnets.\015

Product DescriptionOur leading industry bring forth for our valuable costumers a superior quality Sputtering Target. These Sputtering Target are manufactured from an excellent quality of raw material that ensure durability at its user end. Our clients can avail from us these products at most competitive rates. Materia

MOQ1 Kilograms/Kilograms

HardnessRigid

Purity99.99%-99.999%

Product TypeMetal Alloy

MaterialRe

AlloyNo

Chemical CompositionWRe3 %, WRe5 %, WRe25 %, WRe26 %

Product DescriptionCNM could provide high quality Magnetron Sputtering Target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc. High pure metal sputtering target: Al, Cr, C

Product DescriptionVarious targets provided by our company, made of high-quality raw materials, have the advantages of high purity, high density, good structure and long service life.\015\012They, as the ideal targets for magnetron sputtering coating, including, Cr\343\200\201Cu\343\200\201W\343\200\201Mo\343\200\201T

Product DescriptionWe offer our client an excellent quality range of Sputtering targets. These can be customized as per our precious customers specifications. These are widely known for its durability and quality. Our Sputtering targets can be availed at industrial leading price

Product TypeMachine Parts

MaterialMetal

ConditionNew

Product DescriptionWe are offering our customers a wide range of Tantalum Target, which are available following Specifications :- Execution standard: GB/T, ASTMB and related national standards frequency content 99.95% (maximum: 99.99%) Thickness (mm) width (mm) length (mm) Board: 0.5-10 50-800 50-2000 Metal wood: 0.03