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Mask Aligner-mda-400m

Mask Aligner-mda-400m

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Product Specifications

Dimensions1000x950x800 mm
Dominant ColorGray
FeaturesUV Exposure, Precise Alignment, High Resolution, Easy Operation, Durable Design, Wide Usage
Intensity>15 mW/cm2
Light Source350nm-450nm UV
Mask Size5"x5"
Product TypeMask Aligner
Sample Size4" wafer
UsagePhotolithographic processes for semiconductor and microelectronics manufacturing.

Product Overview

Key Features

Standard Features of Mask Aligner-MDA-400M :-
- Manual Control system
- Sample size : Piece~4" wafer
- Mask size : up to 5"x5"
- 350W UV Exposure Light source
- 350W Power Supply
- Dual CCD zoom microscope
- LCD ( 19 inch ) monitor
- Large Area Stationary Alignment Tooling Module with X,Y,Z and Theta motion
- Wedge Error Compensation ( Air bearing type )
- Dimension : 1000 (W) x 950 (D) x 800 (H) mm
System specification

A. Light source module
- Near UV light source : 350nm to 450nm
- 365nm Intensity : > 15~25 mW/cm2
- Max. Beam Size : 4.25" x 4.25"
- Beam Uniformity :
B. Microscope
- Dual CCD zoom microscope with 19" LCD monitor
- Magnification : 80x ~ 480x ( Monitor )

C. Stage and controller module
- Exposure Timer : 0.01 sec to 999.9 Hour
- Stage movement : X,Y,Z and Theta X, Y : 10 mm, Theta : A 5A , Z Motion Travel : 10 mm
- Contact Mode : Soft, Vacuum, Hard, S.

Company Details

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Seller Details

Taejeon, Taejeon

seles assistant manager

Ms. Camilla Lee

Address

589, YONGSAN-DONG, YUSEONG-GU, DAEJEON, Taejeon, Taejeon, 305-500, Korea South

Testing & Measuring Equipment in Taejeon

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