Diffused Reflectance Measurement System

We have marked a distinctive niche in the market by manufacturing and supplying a wide array of Diffused Reflectance Measurement System from Delhi, India. Diffused reflectance measurement set-up is suitable for measuring diffused reflectance from a textured and or anti reflection coated (ARC) Si wafers of full size 6a x 6a or 5a x 5a . especially designed detectors are used to detect the reflected light from the Si wafer surface. This set-up is designed for quick measurement of diffused reflectance from the full size wafer to quantify the quality of texturing or ARC films on Si wafers. In this design, almost full area of the Si wafer is illuminated by a collimated beam of light using a halogen lamp source. The set-up is very rugged and can be used on a shop floor with ease.

System Features:
Very low measurement time.
Highly sensitive (resolution 0.01 %) especially in the low range (2-20%) of diffused reflectance which is required to test the quality of texturing and ARC coatings.
Can be used to detect non-uniformity of texturing also .
Very easy to use and does not require trained personnel or a clean room.
Very easy to calibrate w.r.t. standard samples.
The operation is computer controlled and all the data can be saved and retrieved as and when required for comparing the results with the final cell output.