Annealing Furnace - High-performance Semiconductor Heating System | Multi-wafer Processing, Adjustable Temperature Control, Optimized For Electrical Property Enhancement

Keeping track with market development, we are indulged in exporting and supplying an excellent quality spectrum of Annealing Furnace in Chennai, Tamil Nadu, India. Annealing Furnace is a used in semiconductor device fabrication which consists of heating multiple semiconductor wafers to affect their electrical properties. Heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film to film or film to wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from implants, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Furnace anneals may be integrated into other furnace processing steps, such as oxidations, or may be processed on their own. Furnace anneals are performed by equipment specially built to heat semiconductor wafers. Furnaces are capable of handling lots of wafers at a time, but each process can last between several hours and a day.