Yof/y5o4f7/yf3 Yttrium Oxyfluoride For Plasma Spray Coating

Thermal Spray Coating Oxide Powder:
Maximum reliability through excellent wear protection, and chemical and thermal stability.
Oxide powders for thermal spraying form hard and wear resistant coating capable of protecting parts even at extreme temperatures. Furthermore, CrownRe can provide not only thermal but also electrical insulation.
Yttrium Ceria Zirconium oxide, Y 2.5%, Ce 25%, Zr 72.5%;
Yttrium oxide, Y2O3, 99.999%; -Plasma spray coating for Semi-conductor/LED field;
Yttrium Fluoride, YF3, 99.999%, Semiconductor grade;
Yttrium Oxyfluoride YOF Y5O4F7 99.999%, oxygen content 0.3-13%, Semiconductor grade ;
Yttria stablized Zirconia YSZ (Y content; 3/5/8mol);
Chromium oxide, Cr2O3;
Aluminum oxide, Al2O3;
Al-Ti mixed;
Zirconium compound ...
Appearance:Agglomerated & Sintered, Spherical
Application: used in plasma spray coating -thermal spray coating; EB-PVD coating, LED/LCD, Semiconductor and much competitive to other company`s materials.
For more detailed specifications and other datas, pls contact our sales department.
Condition : Good
Quality : Good
Storage : Cool and dry place
Purity : 100%
Specialty : Highly Effective


Yttrium oxide (Y2O3) is a rare earth metal oxide that has a wide range of applications in various industries, including semiconductor manufacturing. In semiconductor etching, Y2O3 is used as a hard mask material to protect the semiconductor substrate during the etching process.
Semiconductor etching is a process that removes selected areas of a semiconductor material, such as silicon, to create complex patterns and structures that are used in the fabrication of integrated circuits (ICs), microprocessors, and other electronic devices. The etching process can be performed using either wet or dry methods, depending on the type of material being etched and the desired level of precision and accuracy.
During the etching process, a hard mask material, such as Y2O3, is applied to the surface of the semiconductor substrate to protect the areas that need to remain untouched while the exposed areas are etched away. Y2O3 is an ideal hard mask material due to its high hardness, high thermal stability, and low chemical reactivity with the etching gases.
Y2O3 can be deposited onto the semiconductor substrate using various techniques, such as physical vapor deposition (PVD) or chemical vapor deposition (CVD), to create a thin film that acts as a protective layer during the etching process. After the etching process is completed, the Y2O3 hard mask can be removed using a selective etching process to reveal the patterned semiconductor substrate.
In addition to semiconductor etching, Y2O3 has other applications in the semiconductor industry, such as in the production of high-k dielectric materials for advanced transistor designs and as a dopant material to improve the electrical properties of semiconductors.