Ionfab 300 Ibd

We are amongst leading companies that manufacture and supply an extensive range of Ionfab 300 IBD in Mumbai, Maharashtra, India. Our ion beam deposition products are chosen for their ability to produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides an exceptionally versatile approach to etch and deposition by offering a single tool and maximising system utilisation. Our systems have flexible hardware options including open load, single substrate load lock and cassette to cassette. System specifications are closely tuned to applications, enabling faster and repeatable process results.
Multiple mode functionality
Capable of clustering with other plasma etch and deposition tools
Single wafer loadlock or cluster wafer handling
Dual-beam Configuration
Very low surface film roughness
Unmatched batch uniformity and process reproducibility
Accurate end point detection a SIMS, optical emission