Pecvd System Plasmapro 100 Pecvd
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Product Specifications
| Chamber cleaning | In-situ |
| Electrode type | Resistive heated |
| Features | High throughput, Excellent uniformity, High-quality films, Low cost, Easy service |
| Film properties | Index, stress, etch rate |
| Temperature range | 400°C or 1200°C |
| Throughput | High rate |
| Usage | Thin film deposition |
| Wafer size | Up to 200mm |
Product Overview
Key Features
The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate.
High quality films, high throughput, excellent uniformity
Wide temperature range electrode
Compatible with all wafer sizes up to 200mm
Rapid change between wafer sizes
Low cost of ownership and ease of serviceability
Resistive heated electrodes with capability up to 400A C or 1200A C
In-situ chamber cleaning and end-pointing
Company Details
Business Type
Manufacturer, Service Provider, Distributor, Supplier
Employee Count
11
Establishment
2012
Working Days
To
GST NO
27AABCO6283B1ZK
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Seller Details
GST - 27AABCO6283B1ZK
Mumbai, Maharashtra
Accepts only Domestic inquiries
Marketing Manager
Mr Abhijat Saklani
Address
Unit No - 11, Marwah's Complex, Krishnalal Marwah Marg, Mumbai, Maharashtra, 400072, India
Scientific Instruments in Mumbai
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