As-one Rapid Thermal Processing System

Our firm is a very prominent name of the market for manufacturing and supplying of AS-One Rapid Thermal Processing System to our consumer with the following details:
Applications:
RTA (Rapid Thermal Annealing)
RTO (Rapid Thermal Oxidation)
Contact annealing
Implant annealing
CVD of graphene
CVD of carbon nanotubes
Selenization, sulfurization
The AS-One 100 and 150 systems can process respectively samples up to 100 mm and 150 mm diameter. The machine has been specially developed to meet the requirements of universities, research laboratories, quality control and small-scale production.
The high reliability guarantees low cost of ownership and allows small scale production up to 10,000 wafers per year.
Both pyrometer and thermocouple temperature measurements are standard features. The fast digital PID temperature controller provides high temperature reproducibility (A 1A C). The system assures accurate and repeatable thermal control across the temperature range.
The clam shell style design of the process chamber gives full access to the bedplate and provides easy loading and unloading of the wafers and practical thermocouple installation.
The AS-One can receive a turbo molecular pumping unit in order to provide ultra clean process environment.
Silicon carbide coated graphite susceptors are available for processing of compound semiconductor and small samples.