Annealsys Mc050 System

We are producing and supplying of Annealsys MC050 System to our clients. This is a 2-inch DLI-CVD / DLI-ALD reactor especially developed to meet the requirements of research and development units. It is designed for CVD and ALD processes for deposition of metal and metal alloys, oxides and nitrides. It allows doing heteroepitaxy of oxides on single crystals wafers (such as YBCO/LAO, STO/MgO, MxOy/LAOa ) and polycrystalline oxides deposition on amorphous or polycrystalline substrates by DLI-CVD using a wide range of solid and liquid organometallic volatile precursors. The applications also include metal and nitride deposition.
The infrared lamp furnace and the system design provide multi process capability inside the same process chamber: CVD, ALD, RTP and RTCVD.
The process chamber is made of a horizontal quartz tube with stainless steel flanges. The furnace uses tubular infrared halogen lamps and provides fast ramp rates and allows in-situ annealing processes. The horizontal motion door with the quartz tray provides easy loading and unloading of the substrate as well as of thermocouple installation.
The MC050 can receive different type of liquid delivery and vaporization apparatus. The system is provided with liquid distribution equipment that is designed according to the liquid precursors to be used and their chemical specifications.
Applications:
- Simple and multi-metallic oxides
- Metals, nitrides and alloys
- III-V, wide band gap semiconductors