Ceo2 Sputtering Target

Our offered range of CeO2 sputtering target is available with following specifications :-
purity 99.99% Relative density >99%
Cut surface flatness 3.2Ra
Tolerance A 0.1mm grain size uniform
Material Cr2O3 Brand MAT-CN
Origin Nanchang Jiangxi

Specifications
Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod)
Size 02: length <300mm width <300mm thickness> 1mm rectangular / sheet / step-like (splicing)
Size 03: outer diameter <360mm inner diameter> 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets)
Size 04 :: be customized according to user needs, sample processing, to map processing

Minimum order quantity
1, large concessions

Supply capacity
the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time
a single sheet of material 1 week delivery, bulk material 20 days -30 days delivery(working days)

Production process
vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments
various models magnetron sputtering equipment, etc.

Product uses
industrial-grade coating, experiments or research level Cr2O3 target, electronics, optoelectronics, military, decorative, functional film