Ito Target In Jiangyin
(80 products)
Ito Substrates - 1000x2000mm Crystal Color 10nm-10um Coating Thickness Minimum Line Width 2-10um Customized Shape for Liquid Crystal Alignment and Electro-Optical Systems
GradeA
ShapeRectangle
Size1000*2000mm
ColorCrystal
Indium Tin Oxide Sputtering Target Ito (Bonding Cu) 99.99%
MaterialITO (In2O3+SnO2)
Purity99.99%
Relative Density>99%
Surface Flatness3.2Ra
Tolerance0.1mm
Size OptionsVarious
Machine Parts Ito Azo Gzo Izo Sputtering Target
MaterialIto Azo Gzo Izo
Diameter100Mm
Thickness5Mm
Purity99.99%
Surface FinishSmooth
Tolerance+/-0.1Mm
Beijing Founde Star Science & Technology Co. Ltd.
Beijing
Ceramic Indium Tin Oxide 99.99% High Purity Ito Target
Purity99.99%
CompositionIn2O3:SnO2
Melting point1565 °C
Thermal expansion8.2 10-3K-1
ColorGray
CAS NO50926-11-9
High Density ITO Target
Product DescriptionWe are offering a wide range of High Density ITO Target at very reasonable price. Composition: In2O3(90wt%)/SnO2 (10wt%); other compositions are available on request. Appearance: surface color uniformity; without holes crack and chipping. Purity:>99.99% Relative density: 99.5% Resistivity:1.810-4cm
Beijing Yeke Magnetic Materials Co.ltd
Beijing
Ito Target/In2o3:Sno2=90:10wt%/Ito Planar Sputtering Target
MaterialITO
CompositionIn2O3:SnO2=90:10wt%
Purity99.99%
ShapeSquare/Round
Size25-300mm
Thickness3-10mm
Zhongnuo Advanced Meterial(beijing) Technology Co.limited
Beijing
ITO Sputtering Target
MaterialIndium Tin Oxide
ShapeRectangular Circular
Purity99.99%
DimensionsCustomizable
ThicknessVariable
Density7.15 g/cm³
Hong Kong Chengyi International Co. Limited
Dongguan
ITO target
MaterialITO
Purity99.99%
DiameterVariable
ThicknessVariable
ShapeCircular
UsageThin film deposition applications.
Si Target 99.999%
Purity99.999%
Relative Density>99%
Cut Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialSilicon
Fe Target 99.9%
Purity99.9%
Relative Density>99%
Surface Finish3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialFe
Ta Target 99.95%
Purity99.95%
Relative Density>99%
Cut Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialTantalum
Mg Target 99.99%
Purity99.99%
Relative Density>99%
Cut Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialMg
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| Company Name | Currency | Product Name | Price |
|---|---|---|---|
| - | - | Ceramic Indium Tin Oxide 99.99% High Purity Ito Target | 150 USD ($) (Approx.) |
What is the delivery time for ito target in Jiangyin?
Cr2O3 Target 99.99%
Purity99.99%
Relative Density>99%
Cut Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialCr2O3
Mo Target 99.95%
Purity99.95%
Relative Density>99%
Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialMolybdenum
AlSn Target 99.99%
Purity99.99%
Relative Density>99%
Cut Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialAlSn
CuInGa Target 99.99%
Purity99.99%
Relative Density>99%
Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialCuInGa
Ge Crystal Target 99.999%
MaterialGermanium (Ge)
Purity99.999%
Relative Density>99%
Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
High Purity Manganese Target
Purity99.95%
Relative density>99%
Cut surface flatness3.2Ra
Tolerance0.1mm
Grain sizeUniform
MaterialMn
Reactive Magnetron Sputtering Samarium Target
Purity99.9% 99.5%
Density>99%
Flatness3.2Ra
Tolerance0.1mm
Grain sizeUniform
MaterialSamarium
Sputtering Target MoS2 99.9% Molybdenum Disulfide
MaterialMoS2
Purity99.9%
BondingCu
ShapeRectangular
DimensionsVariable
UsageThin film deposition via sputtering
RF Sputtering Tantalum Target Ta Foil
Purity99.95%
Density16.65g/ml
Melting point2996°C
Relative density>99%
Cut surface flatness3.2Ra
Tolerance0.1mm
Low Tolerance Carbon C Sputtering Target
Purity99.99%
Relative density>99.9%
Flatness3.2Ra
Tolerance0.1mm
Grain sizeUniform
MaterialC
Hi-Purity CdS Sputtering Target Cadmium Sulphide
MaterialCadmium Sulphide
Purity99.99%
ShapeCircular
DiameterVariable
ThicknessVariable
UsageThin-film deposition via sputtering
Zn Target 99.99%
Purity99.99%
Relative Density>99%
Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialZinc
High Purity Sputtering Target
MaterialNickel
Purity99.999%
Density8.9g/m
Melting point1453
Relative density>99%
Cut surface flatness3.2Ra
Ti Titanium Target (Mat-cn)
Purity99.995%
Relative Density>99%
Cut Surface Flatness3.2Ra
Tolerance0.1mm
Grain SizeUniform
MaterialTitanium
Ito Target
MaterialITO
Purity>4N
Density>99.2%
ITO wt%90-10
DimensionsVariable
ShapeRectangular
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