Ito Target In Liuzhou
(49 products)
Low Density ITO Target
CompositionIn2O3:SnO2=95:5
Purity4N
Relative Density62%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky
ITO Sputtering Target
MaterialIndium Tin Oxide
ShapeRectangular Circular
Purity99.99%
DimensionsCustomizable
ThicknessVariable
Density7.15 g/cm³
Hong Kong Chengyi International Co. Limited
Dongguan
ITO target
MaterialITO
Purity99.99%
DiameterVariable
ThicknessVariable
ShapeCircular
UsageThin film deposition applications.
Indium Tin Oxide Sputtering Target Ito (Bonding Cu) 99.99%
MaterialITO (In2O3+SnO2)
Purity99.99%
Relative Density>99%
Surface Flatness3.2Ra
Tolerance0.1mm
Size OptionsVarious
Ito Substrates - 1000x2000mm Crystal Color 10nm-10um Coating Thickness Minimum Line Width 2-10um Customized Shape for Liquid Crystal Alignment and Electro-Optical Systems
GradeA
ShapeRectangle
Size1000*2000mm
ColorCrystal
Machine Parts Ito Azo Gzo Izo Sputtering Target
MaterialIto Azo Gzo Izo
Diameter100Mm
Thickness5Mm
Purity99.99%
Surface FinishSmooth
Tolerance+/-0.1Mm
Beijing Founde Star Science & Technology Co. Ltd.
Beijing
Ceramic Indium Tin Oxide 99.99% High Purity Ito Target
Purity99.99%
CompositionIn2O3:SnO2
Melting point1565 °C
Thermal expansion8.2 10-3K-1
ColorGray
CAS NO50926-11-9
High Density ITO Target
CompositionIn2O3/SnO2
Purity>99.99%
Relative Density99.5%
Resistivity1.8*10^-4cm
Thermal Expansion8.4*10^-6K-1
AppearanceGrey
Beijing Yeke Magnetic Materials Co.ltd
Beijing
ITO and Cu Backing Plate
CompositionIn2O3:SnO2=90:10wt
Purity4N
Relative Density99.7%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky
Used ITO Target
MaterialITO
DimensionsVaried
Conductivity180 cm
Transmittance>87%
Thermal StabilityQualified
Alkali ResistanceQualified
ITO Planar Sputtering Target
CompositionIn2O3:SnO2=97:3 wt%
Purity4N
Density99% theoretical
Resistivity1.8 mm2/m
Deoxygenation0.5%
ShapeFlaky
ITO Rotary Sputtering Target
CompositionIn2O3:SnO2=90:10wt%
Purity4N
Relative Density99.7%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeCylindrical
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| Company Name | Currency | Product Name | Price |
|---|---|---|---|
| - | - | Ceramic Indium Tin Oxide 99.99% High Purity Ito Target | 150 USD ($) (Approx.) |
What is the delivery time for ito target in Liuzhou?
ITO Rotary Sputter Target
CompositionIn2O3:SnO2=90:10wt
Purity4N
Relative Density99.7%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky or other
ITO for display
MaterialITO
Purity99.99%
ThicknessVariable
SizeCustomizable
ResistivityLow
TransmittanceHigh
Titanium Oxide Sputtering Target
CompositionIn2O3:TiO2=98:2mol%
Purity4N
Relative Density98%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky
Sputtering Target Backing Plates
CompositionIn2O3:SnO2=90:10wt
Purity4N
Relative Density99.7%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky
Indium Tin Oxide Sputtering Targets
CompositionIn2O3:SnO2=95:5 wt%
Purity4N
Relative Density99.2%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky
ITO for Solar Cell
MaterialIndium Tin Oxide
ThicknessCustomizable
Purity99.99%
SizeVaried
ShapeRectangular
ConductivityHigh
ITO for Touch Screen
MaterialIndium Tin Oxide
ThicknessVariable
DimensionsCustomizable
Purity99.99%
ResistivityLow
Surface finishSmooth
Chrome Rotary Target
MaterialChrome
DiameterVariable
LengthVariable
Surface FinishHigh polish
Purity99.9%
UsageThin film deposition in optical and industrial applications
Silicon Rotary Target
Length3200mm
MaterialSilicon
TypeRotary
FabricationMetal
ApplicationTarget Bonding
JoiningStainless steel titanium brass
Rotary Target Bonding
MaterialVarious metals
Max Length3800mm
Bonding methodUltrasonic
DiameterCustomizable
InspectionC-scan
ApplicationsSputtering targets
Fpd Target Bonding
MaterialsMetals Ceramics
DimensionsVariable
Bond StrengthHigh
Void PercentageMinimal
ThicknessUniform
Thermal ConductivityHigh
Molybdenum Rotary Target
MaterialMolybdenum
Length1000mm
Diameter100mm
Weight10kg
Surface finishRa 0.2µm
Purity99.95%
Indium Tin Oxide Target
MaterialIndium Tin Oxide
Purity99.99%
SizeCustomizable
ShapeVarious
Density7.15 g/cm³
Thickness1-10mm
Wo3 Target
MaterialWO3
Purity99.99%
Diameter50 mm
Thickness5 mm
ShapeCircular
Surface finishPolished
Ito Target/In2o3:Sno2=90:10wt%/Ito Planar Sputtering Target
MaterialITO
CompositionIn2O3:SnO2=90:10wt%
Purity99.99%
ShapeSquare/Round
Size25-300mm
Thickness3-10mm
Zhongnuo Advanced Meterial(beijing) Technology Co.limited
Beijing
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