Rf Sputtering Tantalum Target Ta Foil
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Product Specifications
| Purity | 99.95% |
| Density | 16.65g/ml |
| Melting point | 2996°C |
| Relative density | >99% |
| Cut surface flatness | 3.2Ra |
| Tolerance | 0.1mm |
| Material | Tantalum |
| Features | High purity, Uniform grain, Excellent quality, Precise tolerance, Superior flatness, Industry leading price, Reliable sputtering |
Product Overview
Key Features
Ta target : 99.95%
Physical properties
Color : Blue-gray
Density : 16.65g/ml
Melting point : 2996
Technical indicators:-
purity : 99.95%
Relative density : >99%
Cut surface flatness : 3.2Ra
Tolerance : A 0.1mm
Grain size : uniform
Material : Ta
Brand : MAT-CN
Origin : Nanchang Jiangxi
Clients can avail this RF Sputtering Tantalum Target Ta Foil at industry leading prices from us.
Company Details
Focusing on a customer-centric approach, China Material Technology Co., Ltd. has a pan-India presence and caters to a huge consumer base throughout the country. Buy Metal Products & Powder in bulk from China Material Technology Co., Ltd. at Trade India quality-assured products.
Business Type
Exporter, Manufacturer
Establishment
2008
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Seller Details
RatingNanchang, Jiangxi
Ms. Iris Yuan
Address
589 GaoXin Road, NanChang Hi-Tech Industry Development Zone, Nanchang, Jiangxi, 330096, China
tantalum foil in Nanchang
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