Sputtering Target In Huizhou
(50 products)
High Grade Sputtering Target
MaterialTaNb alloy
Purity99.95%
Composition50/50 at%
Dimensions120x60mm
ShapeRectangular
Density13 g/cm³
Aluminium Sputtering Target
MaterialAluminum
DimensionsCustomizable
Purity99.99%
ThicknessVariable
TolerancesTight
Surface finishSmooth
Sputtering Targets - Customized High-Quality Metal Alloy | Durable and Reliable Performance
MaterialTitanium
Diameter50mm
Thickness5mm
Purity99.9%
Surface FinishRa 0.2µm
Tolerance+/-0.1mm
Shenzhen Konik Industries Corporation
Shenzhen
Sputtering Target - Premium Quality Metal Coating Material | Widely Appreciated Excellent Durability
MaterialMultiple
DimensionsVaried
Purity99.99%
Tolerance+/-0.1mm
Surface FinishRa<0.4µm
ShapeRectangular/Circular
Sputtering Target - High Purity Metal Composition Enhanced Durability and Efficiency
MaterialVaries
PurityHigh
ShapeCircular/Custom
SizeCustomizable
ThicknessVaries
Surface finishPolished
China Leadmat Advanced Material Co. Ltd
Shenzhen
PZT Sputtering Target
MaterialLead Zirconate Titanate
Purity3N (99.9%)
ShapesCircular Square Custom
DiameterVaried
ThicknessVaried
Grain Size<100mm
Hong Kong Chengyi International Co. Limited
Dongguan
ITO target
MaterialITO
Purity99.99%
DiameterVariable
ThicknessVariable
ShapeCircular
UsageThin film deposition applications.
Grey High Purity 5N 99.999% Polycrystal Silicon Si Planar Target Planar Polysilicon Sputtering Target
Price: 1000 USD ($)/Set
MOQ1 Set/Sets
StrengthHigh
Purity99.999%
Product TypeMetal Alloy
MaterialPolycrystal Silicon Si
AlloyYes
ShapeSheet
Guangzhou Lewell Industry & Trade Co. Ltd
Guangzhou
Sputtering Target - Aluminum Titanium Silver Copper Zinc | High Purity Options with Quality Assurance
MaterialAl Si Ti
PurityAvailable
ShapeRound Rectangular
Grain SizeFine
SurfaceClean
BondingAvailable
Coated-Glass Sputter Target
MaterialSilicon-Aluminum
TechnologyPlasma Spray
ApplicationGlass Coating
Target TypeAlloy Targets
Experience30+ Years
IndustryGlass
FAQs Related to Sputtering Target In Huizhou
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Where can I find sputtering target nearby Huizhou?
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What is the price range of sputtering target in Huizhou?
| Company Name | Currency | Product Name | Price |
|---|---|---|---|
| - | - | High Purity 5N 99.999% Polycrystal Silicon Si Planar Target Planar Polysilicon Sputtering Target | 1000 USD ($) (Approx.) |
| - | - | Molybdenum Alloy Target | 1 USD ($) (Approx.) |
| - | - | Cr Target | 5 USD ($) (Approx.) |
| - | - | Sputtering Target | 1 USD ($) (Approx.) |
What is the delivery time for sputtering target in Huizhou?
How many trusted sellers are available for Sputtering Target in Huizhou?
Titanium Oxide Sputtering Target
CompositionIn2O3:TiO2=98:2mol%
Purity4N
Relative Density98%
Resistivity1.8 mm2/m
Deoxygenation Coefficient0.5%
ShapeFlaky
Molybdenum Alloy Target Chemical Composition: Mo
Price: 1 USD ($)/Piece
MOQ1 Piece/Pieces
Purity99.95%
Product TypeAlloy
MaterialMo
ShapeOther
Chemical CompositionMo
Colorgrey
Zhuzhou Jiabang Refractory Metal Co. Ltd.
Zhuzhou
Molybdenum Sputtering Targets
MaterialMolybdenum
PurityHigh Purity
ShapeRound
DimensionsVaried
SurfaceClean
BoltsFitted
Tantalum Sputtering Target For Coating Bonding Sputtering Application
MaterialTantalum
Purity99.95%
DiameterCustomizable
ThicknessCustomizable
Tolerance±0.05mm
Surface FinishMirror Polish
Zhuzhou Orient Kylin Special Metal Materials Co.ltd
Zhuzhou
Corrosion Resistant Round Tantalum Target Plate With Hardness Of 6 To 6.5 Chemical Composition: Ta
Price Trend: 700.00 - 1000.00 USD ($)/Kilograms
MOQ1 Kilograms/Kilograms
Grade1
Product TypeMetal Products
ShapeRound
Chemical CompositionTa
SizeThickness (0.15~6.0)mm width (50~300)mmAfA-- length (50~1000)mm
WeightCustomization Kilograms (kg)
Corrosion Resistant Tungsten Rhenium Sputtering Target With High Purity Application: Metal Component
Price Trend: 200.00 - 600.00 USD ($)/Kilograms
MOQ1 Kilograms/Kilograms
HardnessRigid
Purity99.99%-99.999%
Product TypeMetal Alloy
MaterialRe
AlloyNo
Chemical CompositionWRe3 % WRe5 % WRe25 % WRe26 %
High Purity Metal Nickel Ni Sputtering Target
DensityHigh-density
ErrorMinimum error
Purity99.9%-99.9995%
ShapesVarious shapes
SizeCustomizable
MaterialNickel
Changsha Xin Kang Advanced Materials Corporation. Ltd.
Changsha
Niobium Targets
Product DescriptionWe are offering our customers a wide range of Niobium Targets which are available following Specifications :-\015\012Material: R04200-1 R04210-2\015\012Size:\015\012Circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm\015\012Rectangular targets: Thickness 1mm up to 12.7mm x Widt
Changsha South Tantalum Niobium Co.ltd.
Changsha
Aluminum Sputtering Target
MaterialAluminum
Density2.7 g/cm³
Melting point660.37 °C
Purity99.9999%
Tolerance+/-0.2mm
ShapesVarious
Tungsten Carbide Sputtering Targets - Coating Type: Galvanized
MOQ100 Unit/Units
UsageIndustrial
SizeDifferent Size
ColorSilver
Coating TypeGalvanized
WarrantyYes
Jiangxi Yatech Materials Co. Ltd.
Jiujiang
Trusted Seller1 Years
Cr Target
Price: 5 USD ($)/Piece
MOQ5 Piece/Pieces
HardnessHigh
StrengthDurable
Product TypeOther Metal Target
MaterialChromium Metal
AlloyCr Target
ShapeOther Disc
Tarfilm Hi-tech Co. Ltd.
Suzhou
Trusted Seller
Premium Seller2 Years
Boron Carbide Sputtering Target - Customized Rods Sheets Tubes | Dark Grey 99.5%-99.95% Purity Vacuum Polybag Packing
Price Trend: 100.00 - 300.00 USD ($)/Piece
MOQ1 Piece/Pieces
Product Typeceramic target
Physical FormOthe
Shapeother
Purity99.5%99.95%
Jiangyin Maideli Advanced Materials Co.ltd
Jiangyin
Titanium Targets
MaterialTitanium Alloys
ShapesCylindrical Plate Tube
StandardsASTM B348/381
PurityHigh
SurfaceCustomizable
DimensionsVariable
Shanghai Taikang Nanochemistry Technology Limited
Shanghai
Zirconium Sputtering Targets
MaterialZirconium
Purity99.5% 99.9%
ShapesRound Rectangle
Density6.508 g/cm3
Melting Point1852°C
Boiling Point4377°C
Advanced Material Technologies Corporation
Shanghai
Sputtering Target - Metal Alloy Composition Nanostructured Thin Film Application Ideal for Semiconductor Coating
MaterialTitanium
Diameter50-200mm
Thickness5-50mm
Purity99.95%
Tolerance+/-0.1mm
Surface finishRa<0.4μm
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