Automatic Cleaning Machine In Rugao
(21 products)
Fully Automatic Quartz Tube Cleaning Machine
MaterialPp
WeldingGerman
GroovesTwo
Spray GunAmerican
DrainageAvailable
ExhaustAvailable
Wafer Pre Cleaning Machine
Body MaterialPP board
Cleaning SlotsFive parts
Pneumatic ValveImported
PFA PipeImported
Circulation SystemPerfluoro
Control SystemElectrical
Developing And Cleaning Machine
FeaturesStrong Consistency Scale Production Double Grooves Auto Complete
Silicon Rod Cleaning Machine
ProcessManual
Rod Size125-140Mm
Rod Length2000-2800Mm
Square Rod156X156X220Mm
Core Size7-10Mm
Core Length2000-5600Mm
Cleaning And Texturing Machine
MaterialStainless steel
Dimensions1200x800x1600 mm
Power380V 50Hz
Capacity1200 wafers/hour
Weight500 kg
ControlPLC
Removing Phosphorosilicate Glass Cleaning Machine
Dimensions6000x1600x2500 mm
Shell materialNPP plate
Tank materialPVDF board
Door materialPVC
Mechanical arms2
Weight capacity30KG
Horizontal Quartz Tube Cleaning Machine
MaterialPolypropylene
DimensionsCustomizable
Pump TypeMechanical
PressureHigh
ControlElectric
Cleaning SystemImmersion
Plate Type Silicon Wafer Cleaning Machine
Cleaning object2-8 inches
ControlImported PLC
StructureSealed
Air exhaustAvailable
ManipulatorUnique
CustomizationAvailable
Cleaning Equipment After Slicing
Dimensions3200x1300x1800mm
MaterialStainless steel 316
Ultrasonic power2KW
Frequency50KHZ
TransducerImported
Control systemElectric
Cleaning System Before PR
Dimensions15000x1780x1600 mm
Main materialPP plate
Control systemPLC
OperationTouchscreen
ValvesQuick exhaust
InjectionDI
Removing Of Photoresist Cleaning Table
MaterialStainless steel
DimensionsCustomizable
Filter Efficiency1000~10 level
Control SystemPLC based
Guide RailsUSA imported
Cleaning Capacity2 baskets/slot
Wafer Cleaning System (Nonstandard Equipment)
MaterialStainless Steel
DimensionsCustomizable
Power220V
WeightVariable
PlcSiemens
ControlTouchscreen
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LCD Cleaning System Before PI (Non-Standard Equipment)
processing_objectGlass Plate
treatment_objectiveCleaning Drying
object_size14-17 inch
equipment_size10450mm
dry_weight5200Kg
transfer_height900mm
Bottle Wash Machine
materialsFM49410 PVC-C
water manifoldPVC
water valvesPneumatic
castersLeg levelers
bottle capacityUp to 8
EPO switchInterlocked
Semiconductor Etching Machine
Product DescriptionWe are engaged in offering excellent quality Semiconductor Etching Machine to our valuable clients. \015\012General description:suitable for etching of 2 "- 8" wafer.Conversion between corrosion grooves and cleaning groove is driven by imported SEW\015\0121.Object: wafer cleaning\015\0122 (1)The
LCD Etching Machine
Shell materialPP plate
Dimensions8000mm x 1780mm x 1900mm
ColorWhite
Deionized water pumpHigh pressure
Nitrogen dryingHigh purity
Vacuum generatorBuilt-in
Vertical Tube Wash Machine
MaterialAcid
ReservoirOnboard
Holding TanksTwo
Water MixDi
Spray ManifoldAvailable
FilterRecirculated
Silicon Wafer Drying Machine
Product TypeDrying Machine
Processing Diameter150mm
StructureDouble Cassette
Motor DriveBrushless Motor
Nitrogen SealingTechnology
Water ControlDeionized
Marangoni Drying Machine (or IPA Vapor Drying) with No Watermarks
Batch Size25/50
Drying Time10-15
No MetallicComponents
No MovingParts
Substrate TypeFlat
IPA ConsumptionLow
Orca-PSS - Steel Customizable Size | 4 Baths 6 Cassette Staging 1500-3000 WPH SECS/GEM Compliant
MaterialSteel
DimensionsCustomizable
Throughput1500-3000 wafers/hour
Cassettes6 input/output
Baths4
SoftwareSECS/GEM compliant
Automatic Silicon Cleaning Machine
Dimensions7280x1500x3160mm
Body material10mm NPP
Frame materialSUS304
Movable doorTransparent PVC
Mechanical armsTwo
Enhance weightLess than 30KG
Suzhou Cse Semiconductor Equipment Technology Co. Ltd.
Rugao
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