Cvd Vacuum Chamber - Application: Thin Film Deposition

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Minimum Order Quantity :

1 Number

Brand Name :

M. J. Enterprise

In Stock

Product Specifications

Coating	Electropolished inner surface
Accuracy	High vacuum integrity, leak rate < 1x10^-7 mbar l/s
Hardness	Rockwell B80-B85
Size	Diameter: 300 mm; Length: 500 mm (customizable)
Shape	Cylindrical chamber with custom flanges
Thread Type	Other, Metric ISO fine threads on flanges and ports
Load Capacity	Up to 50 kg internal fixtures/sample holders
Machine Type	CVD Vacuum System Integration
Weight	Approx. 35 kg
Method	TIG welded construction, helium leak tested
Material	Stainless Steel 304/316
CNC	Yes
Tolerance	0.005 mm
Surface	Other, Polished, mirror finish
Use	Chemical Vapor Deposition processes
Application	Thin film deposition, semiconductor manufacturing, material research
Usage & Applications	For laboratory and industrial CVD reactions

Company Details

Business Type

Exporter, Manufacturer, Service Provider, Supplier

Employee Count

Establishment

1978

Working Days

Monday To Sunday

GST NO

24AHWPG7270K1ZS

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