Following are the Main Features of Arc Discharge System for SWCNTs Production (ArcPilot-200) :-\015\012Arc discharge synthesis of high quality SWCNTs.\015\012Automatically controlled sequential process of electrode loading, discharge, CNTs synthesis and their recovery.\015\012Equipped with specially

Following are the Main Features of PECVD System for OLED Barrier Layers (EL-PECVD Lab-100) :-\015\012SiOx and SiNx rf-PECVD system for R&D and small scale production.\015\012Designed to be compatible with OLED cluster system.\015\012Transformer-coupled high density plasma source.\015\012System and 

Following are the Main Features of ICP CVD System for Graphene and Boron Carbide Layers (PECVD Lab 200) :-\015\012Multi-functional CVD system combined with ICP CVD and probe station.\015\012Maximum substrate temperature: 1,000\302\260C.\015\012Automatic loading available during susceptor heating.\01

Our range of PECVD System for Solar Cell AR Coatings (PECVD Lab-300) are available at following Features :-\015\012Capacitively-Coupled PECVD system with loadlock chamber for R&D and small scale production.\015\012Automatic loadlock system with cassette.\015\012Uniform gas distribution through showe

Following are the Main Features of PECVD System with High Density Plasma (PECVD Lab-1000) :-\015\012SiO2 PECVD system for R&D and small scale production.\015\012Excellent thickness and reflective index uniformity in deposited layer (avg. 7\302\265m).\015\012Highly smooth surface(RMS roughness of dep

We are offering our customers a wide range of PECVD System for Low Temp. CNTs Synthesis (PECVD Lab-100-N), which are available following Specifications :-\015\012Heating range : 400 ~ 600\302\260C\015\012Average throughput : Up to 5,000 wafers per year\015\012Wafer capacity : 1 \303\227 4" \015\012

We are offering our customers a wide range of High Density Plasma Etching System for Waveguides (Cluster Etch-300), which are available following Specifications :-\015\012Wafer capacity : 1 \303\227 6"\015\012Dimension : 1,810L \303\227 1,800H \303\227 1,222W (mm3)\015\012Power : AC 3kW for TCP sour

We are offering our customers a wide range of Evaporation System for Continuous Al Deposition (Roll Evaporator-1000), which are available following Specifications :-\015\012Loading capacity : 5km per day\015\012Average throughput : 15,000km per year\015\012Dimension : 1,730L \303\227 1,200H \303\227

We are offering our customers a wide range of Arc Discharge System for Transparent Electrode (ArcLab-200), which are available following Specifications :-\015\012Carbon rod : ~12\316\246 x 300mm \015\012Average throughput : Up to 10kg per year\015\012Dimension : 1000L x 1400H x 650W(mm3) \015\012Pow

We are instrumental in trading a qualitative range of Industrial Automation including Arc Discharge System for SWCNTs Production (ArcPilot-200), PECVD System for OLED Barrier Layers (EL-PECVD Lab-100), ICP CVD System for Graphene and Boron Carbide Layers (PECVD Lab 200) etc.

A-Tech System - Manufacturer of Industrial Automation, Evaporation System for Continuous Al Deposition (Roll Evaporator-1000), Arc Discharge System for SWCNTs Production (ArcPilot-200) from Incheon, Incheon, Korea South.

A-Tech System - Industrial Automation (9)

All Categories

Arc Discharge System for SWCNTs Production (ArcPilot-200)

PECVD System for OLED Barrier Layers (EL-PECVD Lab-100)

ICP CVD System for Graphene and Boron Carbide Layers (PECVD Lab 200)

PECVD System for Solar Cell AR Coatings (PECVD Lab-300)

PECVD System with High Density Plasma (PECVD Lab-1000) - SiO2, 1730L x 1277H x 725W mm | High Throughput, Excellent Thickness Uniformity, Smooth Surface

PECVD System for Low Temp. CNTs Synthesis (PECVD Lab-100-N)

High Density Plasma Etching System for Waveguides (Cluster Etch-300)

Evaporation System for Continuous Al Deposition (Roll Evaporator-1000)

Arc Discharge System For Transparent Electrode (ArcLab-200) - Carbon Rod 12x300mm, 1000Lx1400Hmm, DC 2kW | High Throughput, He/H2/Ar Gas, Rotary Pump 600 L/Min