We are offering our customers a wide range of Thermal CVD System With Uniform Heating Zone (CVD Lab-50N), which are available following Specifications :-\015\012Heating range : 500 ~ 950\302\260C\015\012Average throughput : Up to 15,000 wafers per year\015\012Wafer capacity : 3 \303\227 2"\015\012Di

Following are the Main Features of Thermal CVD System For Nanowire Synthesis (PECVD Nano Lab-100) :-\015\012Multi-functional thermal CVD system for nanowire synthesis.\015\012Combined with plasma treatment and probe station.\015\012Maximum substrate temperature : 900\302\260C.\015\012Growth directio

Following are the Main Features of Plasma Nitriding And PECVD System (NPPN-120TDS) :-\015\012Batch type of NPPN system for a large area surface treatment(\316\2461,000 x 2,000H).\015\012Plasma nitriding system minimizing ion bombardment using a mesh type of cathode.\015\012Automatically control with

Following are the Main Features of Thermal CVD System For Uniform SiC Coating (CVD Lab1200) :-\015\012Thermal CVD system for SiC coating with MTS bubbler system.\015\012PC control based on PLC.\015\012Convenient Al2O3 tube setup.\015\012Ion exchange type scrubber for SiH4 and Cl gases.\015\012High 

We are offering our customers a wide range of Oder-Made Focused lon Beam System (FIB-A30N), which are available following Specifications :-\015\012System Size : 2,200mm(W)x950mm(D)x1,800mm(H)\015\012Sample Size : Resolution : < 20nm @30kV\015\012Magnification : > 30k\015\012Control Panel : Raith Lit

Following are the Main Features of Vacuum Heating System For Voids Free Soldering And Annealing (Vacuum Soldering-150P) :-\015\012Soldering and rapid thermal annealing under vacuum.\015\012High heating rate using halogen lamp(Max. Temp. 800oC on request).\015\012Process recipes based on customer equ

We are offering our customers a wide range of High Density Plasma Etching System for Magnetic Materials (Etcher-100M), which are available following Specifications :-\015\012Average throughput : Up to 14,400 wafers per year\015\012Wafer capacity : 1 \303\227 4"\015\012Dimension : 1,100L \303\227 1,

Following are the Main Features of Silicon Ingot Growing System For Solar Cell (SIG Lab-1700) :-\015\012Silicon melting and ingot growing system for solar cell applications.\015\012Lab scale of ingot growing (50kg/batch).\015\012Highly efficient and rapid heating.\015\012Automatic PC control system

Following are the Main Features of Plasma Nitriding And PECVD System (NPPN-120T) :-\015\012Batch type of NPPN system for a large area surface treatment(\316\2461,000 x 2,000H).\015\012Plasma nitriding system minimizing ion bombardment using a mesh type of cathode.\015\012Automatically control with 

Following are the Main Features of PECVD-PVD Cluster System For Graphene Synthesis (Graphene Cluster Lab 200) :-\015\012Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis.\015\012Maximum substrate heater temperature: 1,000\302\260C

We are offering our customers a wide range of ICP-RIE System For Nano-Patterning (Etch-200), which are available following Specifications :-\015\012Dimension : 1,370L \303\227 1,970.2H \303\227 931W (mm3)\015\012Wafer capacity : 1 \303\227 4", 1 \303\227 6"\015\012Heater : 6", -60\302\260C LN2 Cooli

We are offering our customers a wide range of Cluster System For PECVD Silicon Layer (Cluster CVD-300), which are available following Specifications :-\015\012Wafer capacity : 1 \303\227 4"\015\012Average throughput : Up to 5,000 wafers per year\015\012Dimension : 2,100L \303\227 1,700H \303\227 1,

We are instrumental in trading a qualitative range of Industrial Supplies General including Thermal CVD System With Uniform Heating Zone (CVD Lab-50N), Thermal CVD System For Nanowire Synthesis (PECVD Nano Lab-100), Plasma Nitriding And PECVD System (NPPN-120TDS) etc.

A-Tech System - Manufacturer of Industrial Supplies General, Vacuum Arc System with 8 Arc Guns (Vacuum Arc Pilot-8H), Hybrid System With Ubms And Ion Guns (Hybrid-100si) from Incheon, Incheon, Korea South.

A-Tech System - Industrial Supplies-General (18)

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Thermal CVD System With Uniform Heating Zone (CVD Lab-50N)

Thermal CVD System For Nanowire Synthesis (PECVD Nano Lab-100)

Plasma Nitriding And PECVD System (NPPN-120TDS)

Thermal Cvd System For Uniform Sic Coating (Cvd Lab1200)

Oder-Made Focused Ion Beam System (FIB-A30N) - 2200x950x1800mm, 30kV Acceleration Voltage, <20nm Resolution, 5-Axis Stage, Dual Gas Injection System

Vacuum Heating System For Voids Free Soldering And Annealing (Vacuum Soldering-150P) - Stainless Steel, 990L Dimension | Rapid Annealing, PC Controlled, Halogen Lamp Heater, Gas Cooling

High Density Plasma Etching System for Magnetic Materials (Etcher-100M)

Silicon Ingot Growing System For Solar Cell (SIG Lab-1700)

Plasma Nitriding And PECVD System (NPPN-120T)

Pecvd-Pvd Cluster System For Graphene Synthesis (Graphene Cluster Lab 200)

ICP-RIE System For Nano-Patterning (Etch-200)

Cluster System For PECVD Silicon Layer (Cluster CVD-300)