Following are the Main Features of Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800E) :- Vacuum furnace with four heating zones Easily movable on rails Quartz tube conveniently exchangeable Plug system movable in x, y, z direction Process range : 400 ~ 900C Operated by PLC touch

Following are the Main Features of Thermal CVD System For Nanowire Synthesis (PECVD Nano Lab-100) :- Multi-functional thermal CVD system for nanowire synthesis. Combined with plasma treatment and probe station. Maximum substrate temperature : 900C. Growth direction controllable Automatic loading ava

We are offering our customers a wide range of Oder-Made Focused lon Beam System (FIB-A30N), which are available following Specifications :- System Size : 2,200mm(W)x950mm(D)x1,800mm(H) Sample Size : Resolution : < 20nm @30kV Magnification : > 30k Control Panel : Raith Lithography Module Probe Curren

Following are the Main Features of Hybrid System With UBMS And Ion Guns (Hybrid-100SI) :- Ion-assisted unbalanced magnetron sputtering system for DLC deposition. Highly charged partices with a high kinetic energy. High degree of flexibility for various substrate materials. Average throughput : Up to

Following are the Main Features of Arc Ion Plating System (Vacuum Arc Pilot-12H) :- Arc ion plating system for a functional coating. Low temperature coating is possible. High deposition rate and ionization degree, good adhesion. Easy process control and cost effective Specifications Chamber body : 8

Following are the Main Features of Plasma Nitriding And PECVD System (NPPN-120TDS) :- Batch type of NPPN system for a large area surface treatment(1,000 x 2,000H). Plasma nitriding system minimizing ion bombardment using a mesh type of cathode. Automatically control with PC interface. Convenient sam

We are offering our customers a wide range of ICP-RIE System For Nano-Patterning (Etch-200), which are available following Specifications :- Dimension : 1,370L  1,970.2H  931W (mm3) Wafer capacity : 1  4", 1  6" Heater : 6", -60C LN2 Cooling Exhaust : Wet Scrubber 1,200SLM Gas Cabinet : 2set Power :

Following are the Main Features of Plasma Nitriding And PECVD System (NPPN-120T) :- Batch type of NPPN system for a large area surface treatment(1,000 x 2,000H). Plasma nitriding system minimizing ion bombardment using a mesh type of cathode. Automatically control with PC interface. Convenient sampl

We are offering our customers a wide range of Thermal CVD System With Uniform Heating Zone (CVD Lab-50N), which are available following Specifications :- Heating range : 500 ~ 950C Average throughput : Up to 15,000 wafers per year Wafer capacity : 3  2" Dimension : 1,500L  1,450H  700W (mm3) Power: 

Following are the Main Features of PECVD-PVD Cluster System For Graphene Synthesis (Graphene Cluster Lab 200) :- Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis. Maximum substrate heater temperature: 1,000C for PECVD, 800C for S

Following are the Main Features of Silicon Ingot Growing System For Solar Cell (SIG Lab-1700) :- Silicon melting and ingot growing system for solar cell applications. Lab scale of ingot growing (50kg/batch). Highly efficient and rapid heating. Automatic PC control system with user-friendly interface

Following are the Main Features of Thermal CVD System For Uniform SiC Coating (CVD Lab1200) :- Thermal CVD system for SiC coating with MTS bubbler system. PC control based on PLC. Convenient Al2O3 tube setup. Ion exchange type scrubber for SiH4 and Cl gases. High sensitivity gas detectors for H2, Cl

We are instrumental in trading a qualitative range of Industrial Supplies General including Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800e), Thermal CVD System For Nanowire Synthesis (PECVD Nano Lab-100), Oder-Made Focused lon Beam System (FIB-A30N) etc.

A-Tech System - Manufacturer of Industrial Supplies General, PECVD-PVD Cluster System For Graphene Synthesis (Graphene Cluster Lab 200), Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800e) from Incheon, Incheon, Korea South.

A-Tech System - Industrial Supplies-General (18)

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Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800e)

Thermal CVD System For Nanowire Synthesis (PECVD Nano Lab-100)

Oder-Made Focused lon Beam System (FIB-A30N)

Hybrid System With Ubms And Ion Guns (Hybrid-100si)

Arc Ion Plating System (Vacuum Arc Pilot-12H)

Plasma Nitriding And PECVD System (NPPN-120TDS)

ICP-RIE System For Nano-Patterning (Etch-200)

Plasma Nitriding And PECVD System (NPPN-120T)

Thermal CVD System With Uniform Heating Zone (CVD Lab-50N)

PECVD-PVD Cluster System For Graphene Synthesis (Graphene Cluster Lab 200)

Silicon Ingot Growing System For Solar Cell (SIG Lab-1700)

Thermal Cvd System For Uniform Sic Coating (Cvd Lab1200)