Following are the Main Features of PECVD-PVD Cluster System For Graphene Synthesis (Graphene Cluster Lab 200) :-\015\012Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis.\015\012Maximum substrate heater temperature: 1,000\302\260C

We are offering our customers a wide range of ICP-RIE System For Nano-Patterning (Etch-200), which are available following Specifications :-\015\012Dimension : 1,370L \303\227 1,970.2H \303\227 931W (mm3)\015\012Wafer capacity : 1 \303\227 4", 1 \303\227 6"\015\012Heater : 6", -60\302\260C LN2 Cooli

We are offering our customers a wide range of Cluster System For PECVD Silicon Layer (Cluster CVD-300), which are available following Specifications :-\015\012Wafer capacity : 1 \303\227 4"\015\012Average throughput : Up to 5,000 wafers per year\015\012Dimension : 2,100L \303\227 1,700H \303\227 1,

Following are the Main Features of Hybrid System With UBMS And Ion Guns (Hybrid-100SI) :-\015\012Ion-assisted unbalanced magnetron sputtering system for DLC deposition.\015\012Highly charged partices with a high kinetic energy.\015\012High degree of flexibility for various substrate materials.\015\

Following are the Main Features of Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800E) :-\015\012Vacuum furnace with four heating zones\015\012Easily movable on rails\015\012Quartz tube conveniently exchangeable\015\012Plug system movable in x, y, z direction\015\012Process range

Following are the Main Features of New Post Plasma Nitriding System (NPPN-1000) :-\015\012Batch type of NPPN(New Post Plasma Nitriding) system for a large area surface treatment(\316\2461,000 x 2,000H)\015\012Plasma nitriding system minimizing ion bombardment using a mesh type of cathode\015\012Auto

Following are the Main Features of Arc Ion Plating System (Vacuum Arc Pilot-12H) :-\015\012Arc ion plating system for a functional coating.\015\012Low temperature coating is possible.\015\012High deposition rate and ionization degree, good adhesion.\015\012Easy process control and cost effective\015

We are offering our customers a wide range of High Density Plasma Etching System for Magnetic Materials (Etcher-100M), which are available following Specifications :-\015\012Average throughput : Up to 14,400 wafers per year\015\012Wafer capacity : 1 \303\227 4"\015\012Dimension : 1,100L \303\227 1,

Following are the Main Features of Silicon Ingot Growing System For Solar Cell (SIG Lab-1700) :-\015\012Silicon melting and ingot growing system for solar cell applications.\015\012Lab scale of ingot growing (50kg/batch).\015\012Highly efficient and rapid heating.\015\012Automatic PC control system

Following are the Main Features of Plasma Nitriding And PECVD System (NPPN-120T) :-\015\012Batch type of NPPN system for a large area surface treatment(\316\2461,000 x 2,000H).\015\012Plasma nitriding system minimizing ion bombardment using a mesh type of cathode.\015\012Automatically control with 

Following are the Main Features of Vacuum Heating System For Voids Free Soldering And Annealing (Vacuum Soldering-150P) :-\015\012Soldering and rapid thermal annealing under vacuum.\015\012High heating rate using halogen lamp(Max. Temp. 800oC on request).\015\012Process recipes based on customer equ

Following are the Main Features of Large Scale Of Plasma Surface Modification And PECVD System (PECVD-B2600) :-\015\012Batch type of large area plasma treatment, plasma nitriding & PECVD system.\015\012(chamber size: ID:2,100mm, L:3,100mm, sample loading: max. 10tons)\015\012Specialized in sequentia

We are instrumental in trading a qualitative range of Industrial Supplies General including Pecvd-Pvd Cluster System For Graphene Synthesis (Graphene Cluster Lab 200), ICP-RIE System For Nano-Patterning (Etch-200), Cluster System For PECVD Silicon Layer (Cluster CVD-300) etc.

A-Tech System - Manufacturer of Industrial Supplies General, PECVD-PVD Cluster System For Graphene Synthesis (Graphene Cluster Lab 200), Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800e) from Incheon, Incheon, Korea South.

A-Tech System - Industrial Supplies-General (18)

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Pecvd-Pvd Cluster System For Graphene Synthesis (Graphene Cluster Lab 200)

ICP-RIE System For Nano-Patterning (Etch-200)

Cluster System For PECVD Silicon Layer (Cluster CVD-300)

Hybrid System With Ubms And Ion Guns (Hybrid-100si)

Vacuum Furnace For Display Materials Purification (Vacuum Furnace-800e)

New Post Plasma Nitriding System (NPPN-1000)

Arc Ion Plating System (Vacuum Arc Pilot-12H)

High Density Plasma Etching System for Magnetic Materials (Etcher-100M)

Silicon Ingot Growing System For Solar Cell (SIG Lab-1700)

Plasma Nitriding And PECVD System (NPPN-120T)

Vacuum Heating System For Voids Free Soldering And Annealing (Vacuum Soldering-150P)

Large Scale Of Plasma Surface Modification And PECVD System (PECVD-B2600)