High Performance Wafer Cleaning Machine - Fully Automatic Cl-512 Model, Multi-cycle Air-assisted Atomizers & Plc Control

For the diverse industrial requirements, we are involved in manufacturing, exporting and supplying the finest quality array of High Performance Wafer Cleaning Machine in Toufen, Miaoli, Taiwan.

Automatically cleaning system:-
CL-512 is a fully automatic cleaning machine design for wafer cleaning after dicing, with high efficiency and multifunction design, CL-512 can easily clean up the residual particles on wafer surface and the dicing ditch.

Advanced cleaning method:-
CL-512 provides high efficiency multi-cycles cleaning process, by the air assisted atomizers design with high pressure of gas mixed with micro drop of water, it can wash away the residual particles in very thin dicing ditch easily and therefore provide the best cleaning effect, drying can accomplished after cleaning with high efficiency blowing process, No impurities and spraying duration, repeating cycle of cleaning and repeating cycles of gas blowing.
PLC program controlled operation CL-512 wafer cleaner is operated by human machine interface via logic microprocessor, all the operation parameters can be easily input to the system or extract from the memory to edit, for examples: working disk spin speed, air-assisted atomizer spraying range, spraying speed, and spraying duration, repeating cycles of cleaning, and repeating cycles of gas blowing.