Our offered range of High Density And High Uniformity Al2O3 Sputtering Target is available with following specifications :- Technical indicators purity 99.99% Relative density >99.9% Cut surface flatness 3.2Ra Tolerance 0.1mm grain size uniform Material Al2O3 Brand MAT-CN Origin Nanchang Jiangxi Chi

Our offered range of CeO2 sputtering target is available with following specifications :- purity 99.99% Relative density >99% Cut surface flatness 3.2Ra Tolerance 0.1mm grain size uniform Material Cr2O3 Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 01: diameter <360mm thickness> 1 mm (waf

We are instrumental in providing to our valuable customers excellent quality Ruthenium Target which is available with following specification:- Material : Ru Ruthenium Brand : MAT-CN Origin : Nanchang Jiangxi Specifications Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod) Size 02

We are engaged in offering excellent quality 99.99 ZnSe Zinc Selenide Pieces Sputtering Target to our valuable clients. Material : ZnSe pieces Brand : MAT-CN Origin : Nanchang Jiangxi Specifications:- Size 01: diameter : <360mm thickness> : 1 mm wafer / round table / rod) Size 02: length : <300mm Wi

We are instrumental in providing to our valuable customers excellent quality Aluminum Sputtering Target which is available with following specification:- Metal : Aluminum(AL) Density : 2.7g/cm3 Melting point : 660.37 Boiling point : 2327 Atomic number : 13 Purity : 99.9% , 99.99%, 99.999%, 99.9999% 

We are offering our customers a wide range of AlMgB14-Aluminum-Magnesium Boron Sputtering Target, which is available in following Specifications :- Technical indicators purity 99.9% Relative density >99.9% Cut surface flatness 3.2Ra Tolerance 0.1mm grain size uniform Material AlMgB14 Brand MAT-CN Or

We are offering our customers a wide range of CuInGaSe-Copper Indium Gallium Selenide Target-Sputtering Target, which is available in following Specifications :- Technical indicators purity 99.99% Relative density >99.9% Cut surface flatness 3.2Ra Tolerance 0.1mm grain size uniform Material CuInGaSe

We are instrumental in trading a qualitative range of Sputtering Target including High Density And High Uniformity Al2O3 Sputtering Target, CeO2 sputtering target, Ruthenium Target etc.

China Material Technology Co., Ltd. - Exporter of Sputtering Target, High Density And High Uniformity Al2O3 Sputtering Target, CeO2 sputtering target from Nanchang, Jiangxi, China.

China Material Technology Co., Ltd. - Sputtering Target (7)

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High Density And High Uniformity Al2O3 Sputtering Target

CeO2 sputtering target

Ruthenium Target

99.99 ZnSe Zinc Selenide Pieces Sputtering Target

Aluminum Sputtering Target

Almgb14-Aluminum-Magnesium Boron Sputtering Target

Cuingase-Copper Indium Gallium Selenide Target-Sputtering Target