AURA Innovative Technologies

Scanning Probe Microscopes: (AFM / STM) Atomic Force Microscope Scanning Tunnelling Microscope Lithography Systems : Nano Imprint Lithography Systems (NIL) E-Beam Lithography (EBL) Direct Laser Writer Photolithography Mask Aligners UV/EUV exposure systems Resistivity and Thickness Measurement Systems Four Point Probe System Kelvin Probe Microscope Hall-Effect Measurement System Probe Station Nano- Indentation System & Scratch testing units Spin Rinser Dryer (SRD) Plasma Cleaning & Etching System Spin Coater Wet Process Station Diffusion/ Oxidation furnaces Annealing and LPCVD systems PECVD, DRIE, ICP-RIE Nano-manipulators Non Contact Surface Profiler Belt Furnace, Muffle furnace, Vacuum Furnace Three Roll Mill Planetary Ball Mill Vacuum , UHV components and systems, Ion sources, RHEED, MBE components, etc. Monochromators/ Spectrographs, CCD camera, detectors, Raman System, Photoluminescence Wafers, Sputtering Targets, High Purity Materials