Tetrafluoromethane Gas Cf4

We are exporting, manufacturing & supplying Tetrafluoromethane Gas CF4 from Foshan, Guangdong, China. Under the normal temperature, the Tetrafluoromethane is the condensibility gas which the achromatic color, the odourlessness, do not burn, the volatility is high, is one of stablest organic compounds, when 900A C, with the copper, the nickel, the tungsten, the molybdenum did not respond, only under carbon arc temperature slow decomposition, in the water, under 25A C and 0.1Mpa its solubility is slightly soluble 0.0015% (load ratio), when with ignitable gaseous combustion, will decompose produces the virulent fluoride.
As the plasma dry etching technique used in a low temperature system air - cooling agent and integrated circuit. Currently, Tetrafluoromethane is the usage biggest as plasma etching technique gas in the micro-electronics industrial , its tall purely gas and the mixed gas(high-purity Tetrafluoromethane mixed with the high-purity oxygen), can extensively be applied to silicon, silicon dioxide, silicon nitride, phosphorosilicate glass and the etching technique of tungsten thin - film material.